| 摘要 |
<p>An equipment status monitoring system and method of operating thereof. The equipment status monitoring system includes first and second microwave mirrors in a plasma processing chamber (20) each forming a multi-modal resonator (35). A power source (60) is coupled to the first mirror (40) and configured to produce an excitation signal. A detector (70) is coupled to at least one of the first mirror (40) and the second mirror (50) and configured to measure an excitation signal. A control system (80) is connected to the detector (70) that compares a measured excitation signal to a normal excitation signal in order to determine a status of the material processing equipment (10).</p> |
