| 发明名称 |
Use of fluorinated additives in the etching or polishing of integrated circuits |
| 摘要 |
Use in etching or polishing of integrated circuits of fluorinated additives of formula (I): T'(C3F6O)n(CFXO)mT (I) having a number average molecular weight in the range 250-400, in particular of the compound Cl(CF2-CF(CF3)O)nCF2COONa.
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| 申请公布号 |
US2003146404(A1) |
申请公布日期 |
2003.08.07 |
| 申请号 |
US20030355072 |
申请日期 |
2003.01.31 |
| 申请人 |
SOLVAY SOLEXIS S.PA. |
发明人 |
VISCA MARIO;CHITTOFRATI ALBA;D'APRILE FIORENZA |
| 分类号 |
B24B37/00;C09G1/02;C09K3/14;C09K13/08;C11D1/00;C11D11/00;H01L21/304;H01L21/306;H01L21/321;H01L21/3213;(IPC1-7):A62D1/00;A62C2/00 |
主分类号 |
B24B37/00 |
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