发明名称 |
METHOD OF TREATING SURFACE, SEMICONDUCTOR DEVICE, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND APPARATUS FOR TREATMENT |
摘要 |
A method of surface treatment in which a surface having a structure formed thereon is treated with a supercritical fluid (4), characterized by adding ammonium hydroxide, an alkanolamine, a fluoroamine, hydrofluoric acid, or the like as a dissolution aid (5) to the supercritical fluid (4). A surface-active substance (6) may be added to the supercritical fluid (4) together with the dissolution aid (5). The surface-active substance (6) may comprise a polar solvent. The method enables residues to be removed without fail by treatment with the supercritical fluid as the only treatment.
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申请公布号 |
WO03065434(A1) |
申请公布日期 |
2003.08.07 |
申请号 |
WO2003JP00938 |
申请日期 |
2003.01.30 |
申请人 |
SONY CORPORATION;SAGA, KOICHIRO |
发明人 |
SAGA, KOICHIRO |
分类号 |
B81C99/00;B81B3/00;B81C1/00;C11D7/08;C11D7/32;C11D7/50;C11D11/00;G03F1/00;G03F7/42;H01L21/304;H01L21/306;H01L21/308;(IPC1-7):H01L21/304 |
主分类号 |
B81C99/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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