发明名称 Semiconductor memory cell and method of forming same
摘要 A semiconductor memory cell and forming method thereof utilizes a vertical select transistor to eliminate the problem of a large cell surface area in memory cells of the related art utilizing phase changes. A memory cell with a smaller surface area than the DRAM device of the related art is achieved by the present invention. Besides low power consumption during read operation, the invention also provides phase change memory having low power consumption even during write operation. Phase change memory also has stable read-out operation.
申请公布号 US2003146469(A1) 申请公布日期 2003.08.07
申请号 US20020307373 申请日期 2002.12.02
申请人 HITACHI, LTD. 发明人 MATSUOKA HIDEYUKI;ITOH KIYOO;TERAO MOTOYASU;HANZAWA SATORU;SAKATA TAKESHI
分类号 G11C13/00;H01L27/10;H01L27/105;H01L27/24;H01L45/00;(IPC1-7):H01L29/76;H01L31/113 主分类号 G11C13/00
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