发明名称 |
Positive photosensitive composition |
摘要 |
A positive photosensitive composition containing (A) an acid generator capable of generating an acid by irradiation with actinic ray or radiation and having a structure represented by formula (I) defined in the specification and (B) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and being decomposed by the action of an acid to increase solubility in an alkali developer.
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申请公布号 |
US2003148206(A1) |
申请公布日期 |
2003.08.07 |
申请号 |
US20020261655 |
申请日期 |
2002.10.02 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
KODAMA KUNIHIKO |
分类号 |
C08F20/18;C08F20/28;C08F32/00;G03F7/004;G03F7/039;H01L21/027;(IPC1-7):H01L51/40;G03G5/00;G03C1/492 |
主分类号 |
C08F20/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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