发明名称 Positive photosensitive composition
摘要 A positive photosensitive composition containing (A) an acid generator capable of generating an acid by irradiation with actinic ray or radiation and having a structure represented by formula (I) defined in the specification and (B) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and being decomposed by the action of an acid to increase solubility in an alkali developer.
申请公布号 US2003148206(A1) 申请公布日期 2003.08.07
申请号 US20020261655 申请日期 2002.10.02
申请人 FUJI PHOTO FILM CO., LTD. 发明人 KODAMA KUNIHIKO
分类号 C08F20/18;C08F20/28;C08F32/00;G03F7/004;G03F7/039;H01L21/027;(IPC1-7):H01L51/40;G03G5/00;G03C1/492 主分类号 C08F20/18
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