发明名称 Stage control apparatus, exposure apparatus, and device manufacturing method
摘要 A stage control apparatus which constitutes at least part of a control system for controlling a stage in alignment operation, including a compensator which generates a signal for controlling to drive the stage to a target position, a resonance elimination unit which has variable cutoff characteristics and eliminates a resonance frequency component contained in an output signal from the compensator to output the signal as a control signal for controlling the stage, and an adjustment unit which sets the cutoff characteristics of the resonance elimination unit, wherein the adjustment unit adjusts the cutoff characteristics of the resonance elimination unit on the basis of a signal generated in the control system.
申请公布号 US2003147062(A1) 申请公布日期 2003.08.07
申请号 US20030353960 申请日期 2003.01.30
申请人 CANON KABUSHIKI KAISHA 发明人 MORISADA MASAHIRO
分类号 G03F9/00;G03F7/20;G05D3/12;H01L21/027;H01L21/68;(IPC1-7):G03B27/58 主分类号 G03F9/00
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