发明名称 |
Dressing apparatus and polishing apparatus |
摘要 |
A dressing apparatus dresses a polishing surface of a polishing table used for polishing a workpiece such as a semiconductor wafer in a polishing apparatus. The dressing apparatus comprises a dresser body (31) connected to a dresser drive shaft (23) which is vertically movable, a dresser plate (32) which is vertically movable with respect to the dresser body (31), and a dressing member (22) held by the dresser plate (32) for dressing the polishing surface (1a). |
申请公布号 |
US2003148707(A1) |
申请公布日期 |
2003.08.07 |
申请号 |
US20030204600 |
申请日期 |
2003.01.24 |
申请人 |
TOGAWA TETSUJI;NOJI IKUTARO;KOJIMA SHUNICHIRO;TAKADA NOBUYUKI |
发明人 |
TOGAWA TETSUJI;NOJI IKUTARO;KOJIMA SHUNICHIRO;TAKADA NOBUYUKI |
分类号 |
B24B37/00;B24B37/04;B24B41/047;B24B49/16;B24B53/007;B24B53/017;B24B53/02;B24B53/12;H01L21/304;(IPC1-7):B24B49/00;B24B1/00 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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