发明名称 |
Polysilicon-edge, low-power, high-frequency bipolar transistor and method of forming the transistor |
摘要 |
A low-power high-frequency bipolar transistor is formed to have a small self-aligned base region that reduces the base-to-collector capacitance, and small self-aligned base and emitter contacts that reduce the base-to-emitter capacitance and the base resistance. The base and emitter contacts are formed to have sub-lithographic feature sizes.
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申请公布号 |
US6603188(B1) |
申请公布日期 |
2003.08.05 |
申请号 |
US20020207628 |
申请日期 |
2002.07.29 |
申请人 |
NATIONAL SEMICONDUCTOR CORPORATION |
发明人 |
DARWISH MOHAMED N.;SADOVNIKOV ALEXEI;RAZOUK REDA |
分类号 |
H01L21/331;H01L29/732;(IPC1-7):H01L27/082 |
主分类号 |
H01L21/331 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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