发明名称 Polysilicon-edge, low-power, high-frequency bipolar transistor and method of forming the transistor
摘要 A low-power high-frequency bipolar transistor is formed to have a small self-aligned base region that reduces the base-to-collector capacitance, and small self-aligned base and emitter contacts that reduce the base-to-emitter capacitance and the base resistance. The base and emitter contacts are formed to have sub-lithographic feature sizes.
申请公布号 US6603188(B1) 申请公布日期 2003.08.05
申请号 US20020207628 申请日期 2002.07.29
申请人 NATIONAL SEMICONDUCTOR CORPORATION 发明人 DARWISH MOHAMED N.;SADOVNIKOV ALEXEI;RAZOUK REDA
分类号 H01L21/331;H01L29/732;(IPC1-7):H01L27/082 主分类号 H01L21/331
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