发明名称 Manufacture of integrated fluidic devices
摘要 In a method of fabricating a microstructure for microfluidics applications, a first layer of etchable material is formed on a suitable substrate. A mechanically stable support layer is formed over the etchable material. A mask is applied over the support to expose at least one opening in the mask. An anistropic etch is then performed through the opening to create a bore extending through the support layer to said layer of etchable material. After performing an isotropic etch through the bore to form a microchannel in the etchable material extending under the support layer, a further layer is deposited over the support layer until overhanging portions meet and thereby close the microchannel formed under the opening.
申请公布号 US6602791(B2) 申请公布日期 2003.08.05
申请号 US20010842836 申请日期 2001.04.27
申请人 DALSA SEMICONDUCTOR INC. 发明人 OUELLET LUC;TYLER HEATHER
分类号 G01N31/20;B01L3/00;B81B1/00;B81C1/00;G01N35/08;G01N37/00;(IPC1-7):H01L21/311 主分类号 G01N31/20
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