发明名称 DIAMOND SUBSTRATE FOR SURFACE ACOUSTIC WAVE ELEMENT, AND SURFACE ACOUSTIC WAVE ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a diamond substrate for a surface acoustic wave element and the surface acoustic element comprising a diamond thin film that has a large propagation velocity of a surface acoustic wave and a small propagation loss to achieve a surface acoustic wave element having a good frequency response. SOLUTION: A filament CVD process is used to form a diamond thin film 240 having a thickness of 20μm on a silicon wafer 220. In this process, an adjustment is made so that the ratio I<SB>(220)</SB>/IT is 0.8 or more, wherein I<SB>(220)</SB>refers to the peak intensity for the diamond crystal face (220) and IT refers to the sum of the peak intensities for the diamond crystal faces (111), (220), (311), (400) and (331), when the diamond thin film 240 is measured by X-ray diffraction, and a hydrogen content in the diamond thin film 240 is in the range 1%-5%, by atomic percent. The diamond thin film is smoothed by a mechanical polishing using a grindstone containing diamond abrasive grains so that the arithmetical mean roughness (Ra) of the surface is 20 nm or less. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003221294(A) 申请公布日期 2003.08.05
申请号 JP20020022249 申请日期 2002.01.30
申请人 SUMITOMO ELECTRIC IND LTD 发明人 ISHIBASHI KEIJI;IMAI TAKAHIRO;KAMIMURA TOMOYOSHI;KAWAGUCHI DAICHI;NAKAHATA HIDEAKI
分类号 C30B29/04;H03H9/25;(IPC1-7):C30B29/04 主分类号 C30B29/04
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