发明名称 |
Ceramic film and method of manufacturing the same, semiconductor device, and piezoelectric device |
摘要 |
A method of manufacturing a ceramic film includes a step of forming a ceramic film 30 by crystallizing a raw material body 20. The raw material body 20 contains different types of raw materials in a mixed state. The different types of raw materials differ from one another in at least one of a crystal growth condition and a crystal growth mechanism in the crystallization of the raw materials. According to this manufacturing method, a surface morphology of the ceramic film can be improved. |
申请公布号 |
US6602344(B2) |
申请公布日期 |
2003.08.05 |
申请号 |
US20010879889 |
申请日期 |
2001.06.14 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
NATORI EIJI;FURUYAMA KOICHI;TASAKI YUZO |
分类号 |
C01B13/14;C01G1/00;C01G29/00;C01G35/00;C04B35/475;C04B35/491;C04B35/624;H01L21/314;H01L21/316;H01L21/822;H01L21/8242;H01L21/8246;H01L27/04;H01L27/105;H01L27/108;H01L41/187;H01L41/24;(IPC1-7):C30B25/02 |
主分类号 |
C01B13/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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