发明名称 Ceramic film and method of manufacturing the same, semiconductor device, and piezoelectric device
摘要 A method of manufacturing a ceramic film includes a step of forming a ceramic film 30 by crystallizing a raw material body 20. The raw material body 20 contains different types of raw materials in a mixed state. The different types of raw materials differ from one another in at least one of a crystal growth condition and a crystal growth mechanism in the crystallization of the raw materials. According to this manufacturing method, a surface morphology of the ceramic film can be improved.
申请公布号 US6602344(B2) 申请公布日期 2003.08.05
申请号 US20010879889 申请日期 2001.06.14
申请人 SEIKO EPSON CORPORATION 发明人 NATORI EIJI;FURUYAMA KOICHI;TASAKI YUZO
分类号 C01B13/14;C01G1/00;C01G29/00;C01G35/00;C04B35/475;C04B35/491;C04B35/624;H01L21/314;H01L21/316;H01L21/822;H01L21/8242;H01L21/8246;H01L27/04;H01L27/105;H01L27/108;H01L41/187;H01L41/24;(IPC1-7):C30B25/02 主分类号 C01B13/14
代理机构 代理人
主权项
地址