发明名称 |
METAL THIN FILM TYPE PRESSURE SENSOR AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PURPOSE: A metal thin film type pressure sensor and a method for manufacturing the same are provided to achieve a compact, light and inexpensive metal thin film type pressure sensor having improved reliability with little hysteresis. CONSTITUTION: A metal thin film type pressure sensor includes: a silicon substrate(10) having silicon membranes(11); strain gauges(12) attached on the silicon membranes(11) of the silicon substrate(10); a Wheatstone bridge formed on the silicon substrate(10); connecting conductors(14) for connecting the strain gauges(12) with the Wheatstone bridge; and electrodes(16) formed on the Wheatstone bridge. A method for manufacturing the metal thin film sensor consists of: a step of forming the silicon membranes(11) on the silicon substrate(10); a step of attaching strain gauges(12) on the silicon membranes(11); a step of connecting the strain gauges(12) with the Wheatstone bridge; and a step of forming the electrodes(16) on the connecting conductors(14).
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申请公布号 |
KR20030064534(A) |
申请公布日期 |
2003.08.02 |
申请号 |
KR20020004863 |
申请日期 |
2002.01.28 |
申请人 |
DONGSEO EDUCATIONAL FOUNDATION |
发明人 |
JUNG, GWI SANG;KIM, IN GYU |
分类号 |
G01L9/06;(IPC1-7):G01L9/06 |
主分类号 |
G01L9/06 |
代理机构 |
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主权项 |
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地址 |
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