发明名称 METAL THIN FILM TYPE PRESSURE SENSOR AND METHOD FOR MANUFACTURING THE SAME
摘要 PURPOSE: A metal thin film type pressure sensor and a method for manufacturing the same are provided to achieve a compact, light and inexpensive metal thin film type pressure sensor having improved reliability with little hysteresis. CONSTITUTION: A metal thin film type pressure sensor includes: a silicon substrate(10) having silicon membranes(11); strain gauges(12) attached on the silicon membranes(11) of the silicon substrate(10); a Wheatstone bridge formed on the silicon substrate(10); connecting conductors(14) for connecting the strain gauges(12) with the Wheatstone bridge; and electrodes(16) formed on the Wheatstone bridge. A method for manufacturing the metal thin film sensor consists of: a step of forming the silicon membranes(11) on the silicon substrate(10); a step of attaching strain gauges(12) on the silicon membranes(11); a step of connecting the strain gauges(12) with the Wheatstone bridge; and a step of forming the electrodes(16) on the connecting conductors(14).
申请公布号 KR20030064534(A) 申请公布日期 2003.08.02
申请号 KR20020004863 申请日期 2002.01.28
申请人 DONGSEO EDUCATIONAL FOUNDATION 发明人 JUNG, GWI SANG;KIM, IN GYU
分类号 G01L9/06;(IPC1-7):G01L9/06 主分类号 G01L9/06
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