| 摘要 |
A highly sensitive, non-contact tank probe to measure surface conductance of thin film structures, and a method for using the same, are described. The tank probe includes inductor (L), capacitor (C) and resistor (R) circuitry that is driven by a signal generator (112) at the probe's resonant frequency. The conductance of a film structure specimen is determined from measuring the signal that is reflected from the tank probe (200) and it respective frequency. Various types of information can be obtained from the tank probe. For instance, information as to film thickness, doping concentration, and the presence of defects can be obtained. In one embodiment of the invention, the tank probe is formed of integrated circuits within a semiconductor substrate. Another aspect of the present invention pertains to a method of using the tank probe system to measure the conductivity of a material specimen. |
