发明名称 |
Polishing pad window for a chemical-mechanical polishing tool |
摘要 |
A polishing pad assembly for use in a chemical-mechanical polishing apparatus comprises a polishing pad having at least a first aperture therethrough and a platen for supporting the polishing pad having a second aperture therethrough at least a portion of which is larger than the first aperture. A substantially transparent plug includes at least a first section having a first dimension for positioning substantially within the first aperture and at least a second section having a second dimension larger than the first dimension for positioning substantially within the second aperture. The optical plug is made of a polymeric material which may be press-fit through the platen into polishing pad.
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申请公布号 |
US2003143925(A1) |
申请公布日期 |
2003.07.31 |
申请号 |
US20020058743 |
申请日期 |
2002.01.28 |
申请人 |
YANG CHARLES CHIUN-CHIEH;HERB JOHN D.;SCHULTZ STEPHEN C. |
发明人 |
YANG CHARLES CHIUN-CHIEH;HERB JOHN D.;SCHULTZ STEPHEN C. |
分类号 |
B24B37/04;B24D13/14;(IPC1-7):B24B49/00 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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