CERAMIC WAFER FOR PREPARATORY DEPOSITION

摘要

PURPOSE: A ceramic wafer for preparatory deposition is provided to improve the reliability of a preparatory deposition process by forming a plurality of roughness types for increasing the surface area on the ceramic wafer. CONSTITUTION: The ceramic wafer(180) is used for the preparatory deposition process. The plurality of roughness types(180a) are formed on the ceramic wafer. The plurality of roughness types may be a plurality of concentric types whose diameter becomes larger as it goes from the center of the ceramic wafer to the edge of the ceramic wafer.