发明名称 IGBT HAVING THICK BUFFER REGION
摘要 <p>An IGBT (Fig. 9) has a thick buffer region with increased doping to improve self-clamped inductive switching and device manufacture. A planar or trench gate IGBT has a buffer layer more than 25 microns thick. The buffer layer is doped high enough so that its carriers are more numerous than minority carriers, particularly at the transition between the N buffer &amp; N drift region.</p>
申请公布号 WO2003063204(A2) 申请公布日期 2003.07.31
申请号 US2003001466 申请日期 2003.01.16
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