发明名称 METHOD OF SUPPLYING GAS, METHOD AND DEVICE FOR PREVENTING BACK DIFFUSION OF GAS, OPERATING VALVE WITH REVERSE GAS DIFFUSION PREVENTING MECHANISM, VAPORIZER WITH REVERSE GAS DIFFUSION PREVENTING MECHANISM, METHOD AND DEVICE FOR VAPORIZING AND SUPPLYING LIQUID MATERIAL, METHOD OF SUPPLYING GAS FOR SEMICONDUCTOR MANUFACTURING DEVICE, AND SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To prevent the reverse diffusion of principal gases to the upstream side of a pipeline at the time of supplying the gases. SOLUTION: In a method of supplying gas, a discontinuous internal wall surface section 5 is formed at a halfway of a gas supply pipeline 2, and a principal gas 13 is supplied from an upstream-side gas supply pipeline 2A while a shield gas 14 is introduced along the internal wall surface on a downstream-side gas supply pipeline 2B, through the discontinuous internal wall surface section 5. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003218042(A) 申请公布日期 2003.07.31
申请号 JP20020017231 申请日期 2002.01.25
申请人 SONY CORP 发明人 ADACHI KEN;HORIUCHI SATOSHI
分类号 C23C16/455;H01L21/205;(IPC1-7):H01L21/205 主分类号 C23C16/455
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