发明名称 PROCESS CONTROL IN ELECTRO-CHEMICAL MECHANICAL POLISHING
摘要 <p>Systems and methods for detecting the endpoint of a polishing step. In general, an electropolishing system is provided with a power supply configured to deliver a current through an electrolytic solution. Signal characteristics of the signal provided by the power supply are monitored to determine a polishing endpoint. Illustratively, the monitored signal characteristics include current and voltage. In another embodiment, current is related to material removed. Current is then monitored over time to determine total material removed.</p>
申请公布号 WO2003061905(A1) 申请公布日期 2003.07.31
申请号 US2003001760 申请日期 2003.01.21
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