发明名称 PATTERN INSPECTION METHOD AND ITS APPARATUS
摘要 A pattern inspection technique using compared images is improved in that the amount of displacement between compared images can be detected precisely and with high speed, thereby making it possible to detect in high-speed and inspect particles with high sensitivity. To achieve this technique, each of an inspected image and a reference image is divided into a plurality of small regions, and the amount of displacement between the whole inspected image and the whole reference image is determined by using reliable information of displacement between the divided images of both images. In addition, the displacement-computed regions, the computation order and the image search range are previously scheduled.
申请公布号 IL154157(D0) 申请公布日期 2003.07.31
申请号 IL20030154157 申请日期 2003.01.27
申请人 HITACHI, LTD.;TOKYO SEIMITSU CO., LTD.;HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人
分类号 G01B11/00;G01N21/956;G06T1/00;G06T7/00;H01L21/66;(IPC1-7):G06K 主分类号 G01B11/00
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