发明名称 OZONE PROCESSING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide an ozone processing system in which reaction efficiency of ozone is enhanced by making the ozone gas flow layer thin. SOLUTION: The ozone processing system 1 comprises a table 20 for mounting a substrate K, a heater for heating the substrate K on the mounting table 20, a plurality of counter plates 40 each having an opening for ejecting a processing gas containing ozone toward the substrate K in the surface facing the substrate K, and means 60 for supplying the processing gas to the ejection opening of each counter plate 40 and ejecting the processing gas therefrom. The counter plates 40 are arranged in the same plane such that a gap is formed between the adjacent counter plates 40. The gap between the lower surface of the counter plate 40 and the surface of the substrate K is set in the range of 0.2-1 mm. With such an arrangement, the ratio of ozones contributive to processing can be increased by making thin the ozone gas flow layer and reaction efficiency can be enhanced. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003218094(A) 申请公布日期 2003.07.31
申请号 JP20020015990 申请日期 2002.01.24
申请人 SUMITOMO PRECISION PROD CO LTD 发明人 KIKUCHI TATSUO;YAMANAKA TAKEO;YAMAGUCHI MASATAKA;KANAYAMA TOKIKO
分类号 G03F7/42;H01L21/027;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):H01L21/306 主分类号 G03F7/42
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