| 摘要 |
PURPOSE: A disc of an ion implanting apparatus is provided to prevent a wafer from being ejected from a site when the disc spins by fixing the wafer to a right position inside a fence even if a misalignment between a robot arm and the site occurs and by reducing a phenomenon that a pull rod is pushed back by centrifugal force generated when the disc spins. CONSTITUTION: A plurality of site structures including the site, the fence and the pull rod are formed inside the outer circumferential surface of a disc-type body of the ion implanting apparatus, separated from each other by a predetermined interval. The pull rod includes the rollers(116a,116b) installed in two branches upwardly branching from one rod so that the radius of the force that the pull rod pushes the wafer becomes large. Bars(130a,130b) for maintaining a uniform interval between the roller and the site are attached to the outer circumferential surface of the site facing the roller. A wrinkle-type cover that expands and contracts according to the transfer of the pull rod is included in the outside of a groove where the pull rod is received so that the pull rod is prevented from being pushed, but the pull rod reciprocates.
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