发明名称 PHOTOREACTIVE RESIN COMPOSITION, AND METHOD FOR MANUFACTURING CIRCUIT BOARD AND CERAMIC MULTILAYER BOARD BY USING THE SAME
摘要 A photoreactive resin composition having high sensitivity and causing less gelation, and methods of manufacturing a circuit board and a ceramic multilayer substrate having a high-resolution wiring pattern and via holes by a photolithography process using the photoreactive resin composition are described. The photoreactive resin composition contains an inorganic powder containing a polyvalent metal powder and/or a polyvalent metal oxide powder, an alkali-soluble first polymer having an ethylenically unsaturated double bond, a monomer having an ethylenically unsaturated double bond, a photoreaction initiator, an organic solvent, and a second polymer having a pyrrolidone ring in a side chain.
申请公布号 KR20030064246(A) 申请公布日期 2003.07.31
申请号 KR20020045828 申请日期 2002.08.02
申请人 发明人
分类号 H05K1/09;H05K3/46;C08F2/44;C08F291/12;G03F7/004;H01L23/12;H05K3/02;H05K3/20 主分类号 H05K1/09
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