发明名称 METHOD AND SYSTEM FOR DISCHARGE PLASMA PROCESSING
摘要 <P>PROBLEM TO BE SOLVED: To provide a method and a system for processing the surface of an article uniformly through a simple method by controlling plasma gas standing on the surface of the article. <P>SOLUTION: In the method for processing an article placed on the outside of a plasma generating space by blowing plasma from the plasma blowing nozzle of an electrode structure generating glow discharge plasma by applying a field between a pair of counter electrodes having at least one counter face coated with a solid dielectric and introducing processing gas between the counter electrodes, the angle between the article and the blowing direction of plasma is set in the range of 0-70&deg;. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003218099(A) 申请公布日期 2003.07.31
申请号 JP20020011657 申请日期 2002.01.21
申请人 SEKISUI CHEM CO LTD 发明人 KAWASAKI SHINICHI
分类号 H05H1/24;B01J19/08;H01L21/31 主分类号 H05H1/24
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