| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a remote-type discharge plasma having an electrode structure capable of sufficiently enlarging a discharge space, inhibiting the generation of streamer discharge, performing the discharge capable of generating plasma of high density with small power, and inhibiting the deterioration of solid dielectric covering the electrode. <P>SOLUTION: In this discharge plasma processing device wherein the solid dielectric is mounted on at least one of opposite faces of electrodes opposite to each other under the pressure near the atmospheric pressure, and the discharge plasma obtained by introducing a processing gas and applying the electric field, is brought into contact with a processed object mounted outside of the discharge space to process the object, the opposite faces of the electrode have the approximately hog-backed shape formed by a convex curved face of a radius of curvature of 25 mm or more and 2000 mm or less. <P>COPYRIGHT: (C)2003,JPO |
