发明名称 Apparatus for etching or depositing a desired profile onto a surface
摘要 An apparatus and method for modifying the surface of an object by contacting said surface with a liquid processing solution using the liquid applicator geometry and Marangoni effect (surface tension gradient-driven flow) to define and confine the dimensions of the wetted zone on said object surface. In particular, the method and apparatus involve contouring or figuring the surface of an object using an etchant solution as the wetting fluid and using real-time metrology (e.g. interferometry) to control the placement and dwell time of this wetted zone locally on the surface of said object, thereby removing material from the surface of the object in a controlled manner. One demonstrated manifestation is in the deterministic optical figuring of thin glasses by wet chemical etching using a buffered hydrofluoric acid solution and Marangoni effect.
申请公布号 US2003141275(A1) 申请公布日期 2003.07.31
申请号 US20030350709 申请日期 2003.01.24
申请人 THE REGENTS OF THE UNIVERSITY OF CALIFORNIA 发明人 RUSHFORD MICHAEL C.;BRITTEN JERALD A.
分类号 C03C15/00;C03C15/02;G02B6/12;G02B6/36;H01L21/00;(IPC1-7):C23F1/00 主分类号 C03C15/00
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