发明名称 Resist pattern for alignment measurement
摘要 A resist pattern for alignment measurement being shrunk by a heat flow comprises a plurality of positive type or negative type line patterns. Widths of spaces between the line patters are greater than twice those of the line patterns. Alternatively, the resist pattern comprises a box-shaped or slit-shaped measurement pattern and a pair of box-shaped or slit-shaped auxiliary patterns provided inside and outside the measurement pattern, respectively.
申请公布号 US2003141606(A1) 申请公布日期 2003.07.31
申请号 US20030351418 申请日期 2003.01.27
申请人 YUSA HIROYUKI;YANAGISAWA AZUSA;KIKUCHI TOSHIFUMI;MAKIUCHI AKIHIRO 发明人 YUSA HIROYUKI;YANAGISAWA AZUSA;KIKUCHI TOSHIFUMI;MAKIUCHI AKIHIRO
分类号 G03F7/20;H01L21/027;H01L23/544;(IPC1-7):H01L23/544 主分类号 G03F7/20
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