发明名称 |
Resist pattern for alignment measurement |
摘要 |
A resist pattern for alignment measurement being shrunk by a heat flow comprises a plurality of positive type or negative type line patterns. Widths of spaces between the line patters are greater than twice those of the line patterns. Alternatively, the resist pattern comprises a box-shaped or slit-shaped measurement pattern and a pair of box-shaped or slit-shaped auxiliary patterns provided inside and outside the measurement pattern, respectively.
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申请公布号 |
US2003141606(A1) |
申请公布日期 |
2003.07.31 |
申请号 |
US20030351418 |
申请日期 |
2003.01.27 |
申请人 |
YUSA HIROYUKI;YANAGISAWA AZUSA;KIKUCHI TOSHIFUMI;MAKIUCHI AKIHIRO |
发明人 |
YUSA HIROYUKI;YANAGISAWA AZUSA;KIKUCHI TOSHIFUMI;MAKIUCHI AKIHIRO |
分类号 |
G03F7/20;H01L21/027;H01L23/544;(IPC1-7):H01L23/544 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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