发明名称 METHOD OF PROCESSING SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a resist solution feeding mechanism which is capable of carrying out the dummy dispensation of a resist solution corresponding to each purpose. <P>SOLUTION: The discharge volume and supply start condition of a resist solution are set up in a main control unit 85 for each of dummy dispensations D1 to D4 each having a different purpose. The dummy dispensations D1 to D4 are given different priorities respectively, and the dummy dispensations D1 and D2 are given first priority (1) and second priority (2) respectively. The dummy dispensations D3 and D4 are given independent priorities different from the start conditions of the other dummy dispensations D1 and D2. When the dummy dispensation D1 is performed, the counts of the start conditions of the dummy dispensation D1 and the dummy dispensation D2 having a lower priority than the dummy dispensation D1 are reset. When the dummy dispensation D2 is performed, only the start condition of the dispensation D2 is reset. When the dispensation D3 or D4 is performed, only the start condition of the dispensation D3 or D4 is reset. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003218006(A) 申请公布日期 2003.07.31
申请号 JP20020012810 申请日期 2002.01.22
申请人 TOKYO ELECTRON LTD 发明人 MIYATA AKIRA
分类号 G03F7/16;H01L21/027 主分类号 G03F7/16
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