发明名称 MAGNETORESISTIVE EFFECT ELEMENT, ITS MANUFACTURING METHOD, AND MAGNETIC MEMORY DEVICE
摘要 PROBLEM TO BE SOLVED: To suppress the resistance fluctuation between tunnel magnetoresistive effect type storage elements to a low level while a large TMR ratio is obtained. SOLUTION: A tunnel magnetoresistive effect element has a multilayered film structure including two ferromagnetic layers 11 and 12 and a barrier layer 13 sandwiched between the layers 11 and 13. At the time of constituting the element, the barrier layer 13 is formed by forming a conductive layer 16 containing a metallic material as the main component and an added material of a different kind of element on one ferromagnetic layer 11 after the layer 11 is formed and oxidizing the conductive layer 16. Thereafter, the other ferromagnetic layer 12 is formed on the barrier layer 13. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003218427(A) 申请公布日期 2003.07.31
申请号 JP20020014259 申请日期 2002.01.23
申请人 SONY CORP 发明人 HIGO YUTAKA;BESSHO KAZUHIRO;MIZUGUCHI TETSUYA;YAMAMOTO TETSUYA;HOSOMI MASAKATSU;OBA KAZUHIRO;KANO HIROSHI
分类号 G11B5/39;H01F10/32;H01F41/30;H01L21/8246;H01L27/105;H01L43/08;H01L43/12;(IPC1-7):H01L43/08 主分类号 G11B5/39
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