发明名称 SYSTEMS AND METHODS FOR CLOSED LOOP DEFECT REDUCTION
摘要 Systems and methods for repairing defects on a specimen are provided. A method may include processing a specimen, detecting defects on the specimen, and repairing one or more of the defects. An additional method may include detecting defects on a specimen, repairing one or more of the defects, and inspecting the specimen to detect defects remaining on the specimen subsequent to repair. A system may include a process chamber, a measurement device configured to detect defects on a specimen, and a repair tool configured to repair one or more of the defects detected on the specimen. An additional system may include a measurement device, a repair tool, and an inspection tool configured to detect defects remaining on the specimen subsequent to repair. The systems may also include a processor configured to alter a parameter of an instrument coupled to the repair tool in response to output from the measurement device.
申请公布号 WO03063233(A2) 申请公布日期 2003.07.31
申请号 WO2003US01419 申请日期 2003.01.16
申请人 KLA-TENCOR TECHNOLOGIES CORP. 发明人 MARELLA, PAUL
分类号 G01B21/30;G01N21/55;G01N21/956;G01N23/225;H01L21/66 主分类号 G01B21/30
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