TARGET OF HIGH-PURITY NICKEL OR NICKEL ALLOY AND ITS PRODUCING METHOD

摘要

A target of high−purity nickel or a nickel alloy for magnetron sputtering by which a sputter film excellent in uniformity is formed. The target is characterized by exhibiting a permeability of 100 or more. Use of such a target improves the uniformity of the film (uniformity of thickness of the film) and the ignitability of the plasma even in the manufacturing process using a 300−mm wafer. A method for producing such a target is also disclosed.