发明名称 METHOD FOR FORMING LAYER STRUCTURE ON SUBSTRATE
摘要 <p><P>PROBLEM TO BE SOLVED: To improve a method of a conventional technique so that a thin brittle flat substrate can be subjected to a process for making and forming semiconductor elements such as solar cells within a desired limit and ought to be protected from breaking and deforming by using an inexpensive means. <P>SOLUTION: A brittle substrate 10 is coated with an inorganic ceramic material 12, and successively, the inorganic ceramic material is heat-treated for hardening and sintering. <P>COPYRIGHT: (C)2003,JPO</p>
申请公布号 JP2003218370(A) 申请公布日期 2003.07.31
申请号 JP20020369948 申请日期 2002.12.20
申请人 RWE SCHOTT SOLAR GMBH 发明人 SCHWIRTLICH INGO;SCHMIDT WILFRIED;CAMPE HILMAR VON
分类号 H01L31/04;B05D3/02;B05D5/12;B32B18/00;C04B;C04B37/00;C23C18/12;H01L31/00;H01L31/0392;H01L31/042;(IPC1-7):H01L31/04 主分类号 H01L31/04
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