发明名称 |
METHOD FOR FORMING LAYER STRUCTURE ON SUBSTRATE |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To improve a method of a conventional technique so that a thin brittle flat substrate can be subjected to a process for making and forming semiconductor elements such as solar cells within a desired limit and ought to be protected from breaking and deforming by using an inexpensive means. <P>SOLUTION: A brittle substrate 10 is coated with an inorganic ceramic material 12, and successively, the inorganic ceramic material is heat-treated for hardening and sintering. <P>COPYRIGHT: (C)2003,JPO</p> |
申请公布号 |
JP2003218370(A) |
申请公布日期 |
2003.07.31 |
申请号 |
JP20020369948 |
申请日期 |
2002.12.20 |
申请人 |
RWE SCHOTT SOLAR GMBH |
发明人 |
SCHWIRTLICH INGO;SCHMIDT WILFRIED;CAMPE HILMAR VON |
分类号 |
H01L31/04;B05D3/02;B05D5/12;B32B18/00;C04B;C04B37/00;C23C18/12;H01L31/00;H01L31/0392;H01L31/042;(IPC1-7):H01L31/04 |
主分类号 |
H01L31/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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