发明名称 ANTIREFLECTION FILM FOR TRANSFER, ITS MANUFACTURING METHOD, AND OBJECT SUBJECTED TO ANTIREFLECTION TREATMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an antireflection film for transfer by which a low-reflective index layer and a high-refractive index layer constituting an antireflection coating are uniformly deposited by coating and which has high manufacturing efficiency. <P>SOLUTION: The antireflection film for transfer has a support 1, an antireflection coating 2 comprising a low-refractive index layer 2a provided on the support 1 and a high-refractive index layer 2b which is provided on the low-refractive index layer 2a and has a refractive index higher than that of the low-refractive index layer, and an adhesive layer 3 provided on the antireflection coating 2, and the low-refractive index layer 2a is a hard coat layer cured by ultraviolet rays, and the support 1 can be peeled off the antireflection coating 2. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003215308(A) 申请公布日期 2003.07.30
申请号 JP20020016462 申请日期 2002.01.25
申请人 TDK CORP 发明人 TAMAI KIMINORI
分类号 G02F1/1335;B32B7/02;B32B7/06;G02B1/10;G02B1/11;G09F9/00 主分类号 G02F1/1335
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