| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition having highly transparency to radiations ranging from vacuum ultraviolet rays to visible rays, good adhesion to substrates, high film-forming properties, etc., and comprising a new fluorocopolymer and an acid generator. <P>SOLUTION: The positive resist composition comprises a fluorocopolymer essentially consisting of at least an α-fluoroalkylacrylic monomer with a moiety represented by formula (1) and a vinyl ether with a moiety represented by formula (2) and an acid generator. <P>COPYRIGHT: (C)2003,JPO |
