| 摘要 |
PROBLEM TO BE SOLVED: To provide a photoreactive composition capable of preparing silicon oxide at a low temperature by photoreaction, removing impurities from the interior of a film by a heat treatment after film making and obtaining excellent film quality because photoreaction proceeds in a nonaqueous state. SOLUTION: This photoreactive composition comprises (A) a compound having a molecular skeleton represented by general formula (1) (X is a functional group having a hydrolyzable property) and (B) a compound having a molecular skeleton represented by general formula (2) (Y is an atom of the group IVB of the periodic table excluding carbon atom or an atom of the group VB of the periodic table and, n represented by (n) attached to upper right of the atom Y represents a number of bond of the atom Y; Z is hydrogen atom, a hydrocarbon group, a hydroxy group, a mercapto group, an amino group, a halogen group, an alkoxyl group, an alkylthio group, a carbonyloxy group or oxo group and n of n-2 attached to lower right of Z represents an integer of 2-5, with the proviso that when n is 4 and Z is oxo group, the number of Z is 1 and when n is 5 and one of Z is oxo group, the number of Z excluding oxo group is 1). COPYRIGHT: (C)2003,JPO
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