发明名称 Photoreactive resin composition
摘要 A photoreactive resin composition comprises an inorganic powder comprising at least one of a polyvalent metal powder and a polyvalent metal oxide powder, an alkali-soluble polymer containing an ethylenically unsaturated double bond, an ethylenically unsaturated monomer, a photoreaction initiator, an organic solvent, and a second polymer having a pyrrolidone ring in a side chain. The polyvalent metal powder preferably comprises copper powder coated with copper oxide. The second polymer is preferably polyvinylpyrrolidone or a copolymer thereof. The organic solvent preferably comprises a diol and the resin composition may also comprise a polyhydric alcohol having four or more hydroxide groups per molecule. Also claimed is a resin composition wherein average particle diameters for the inorganic powder, molecular weights and acid values for an alkali-soluble (meth)acrylic polymer, boiling points for the organic solvent and Fitkentsher viscosity vales of the pyrrolidone polymer are specified. Further claimed is a method of manufacturing a circuit board and ceramic multilayer substrate comprising the composition.
申请公布号 GB2384489(A) 申请公布日期 2003.07.30
申请号 GB20020017516 申请日期 2002.07.29
申请人 * MURATA MANUFACTURING CO., LTD. 发明人 MASAHIRO * KUBOTA;MICHIAKI * IHA;SHIZUHARU * WATANABE
分类号 H05K1/09;C08F2/44;C08F291/12;G03F7/004;H01L23/12;H05K3/02;H05K3/20;H05K3/46 主分类号 H05K1/09
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