| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid material vaporizing apparatus in which the generation of non-vaporized residues and thermal-decomposition residues is reduced, and the vaporizing efficiency is improved. SOLUTION: A nozzle 1 to atomize and spray a liquid material is fixed to a vaporizing chamber 2 so as to spray the liquid material in the horizontal direction, the liquid material is scattered by the scattering force in the horizontal direction corresponding to the particle size of the sprayed liquid material, and the gravity corresponding to the mass, the heating temperature of a bottom part (areas 22a, 22b and 22c) of the vaporizing chamber 2 is changed step by step corresponding to the distance from the nozzle 1, and the thermal energy optimum to the liquid particles is supplied to reduce the non-vaporized residues and the thermal-decomposition residues, and to improve the vaporizing efficiency. COPYRIGHT: (C)2003,JPO
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