发明名称 THIN FILM FORMING METHOD, SOLUTION USED THEREIN AND ELECTRONIC DEVICE FABRICATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method for crystallizing a very small amount of solution arranged on the prescribed position on a substrate. SOLUTION: Liquid droplets of the solution in which a thin film forming material are arranged on the substrate by ejecting the solution by a ink-jet method. Crystalline nuclei are produced in the solution by controlling a partial pressure of a gas having the same component as that of the solvent in the vicinity of the liquid droplets just after being arranged to a value equal to or almost equal to the saturated vapor pressure, for example. After the crystalline nuclei are produced, the partial pressure of the gas in the vicinity of the liquid droplets is lowered to 1/10 to 1/100 of the saturated vapor pressure, for example. Solution containing the thin film forming material of such an amount that the concentration when ejected becomes≥1/10 of the saturated concentration is used as the solution. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003212686(A) 申请公布日期 2003.07.30
申请号 JP20020295163 申请日期 2002.10.08
申请人 SEIKO EPSON CORP 发明人 MORII KATSUYUKI;MASUDA TAKASHI
分类号 H05B33/10;C30B7/06;C30B29/54;H01L51/50;H05B33/14;(IPC1-7):C30B7/06 主分类号 H05B33/10
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