发明名称 DEVICE AND METHOD OF ANODIC FORMATION
摘要 <p><P>PROBLEM TO BE SOLVED: To process a large sized substrate to be processed by using smaller components in an anodic formation device and an anodic formation method for processing the substrate to be processed by using the substrate as an anode and electrochemically processing the substrate by irradiating it with light. <P>SOLUTION: The electric contact of a contact member with the substrate to be processed is given by either a plurality of contact members or positional changes of a contact member. The substrate to be processed is preliminarily manufactured so that every partial electrically conductive layer of the portion to be processed is connected to the contact part of a plurality of contact members. The electric current necessary for processing is saved by limiting it to an amount which corresponds to a part of the portion to be processed by using a combination of the substrate to be processed and the contact members, and by either energizing only a part of contact members through a change over switch or energizing the contact member in a way that the energizing is given to a part of the electrically conductive layer of the substrate to be processed by moving the contact member. <P>COPYRIGHT: (C)2003,JPO</p>
申请公布号 JP2003213495(A) 申请公布日期 2003.07.30
申请号 JP20020012212 申请日期 2002.01.21
申请人 TOKYO ELECTRON LTD 发明人 YAGI YASUSHI;AOKI KAZUJI;USHIJIMA MITSURU
分类号 C25D11/32;C25D11/02;C25D17/00;C25D21/00;H01J9/02;H01L21/3063;(IPC1-7):C25D17/00 主分类号 C25D11/32
代理机构 代理人
主权项
地址