发明名称 METALLIC FILM PATTERN AND PRODUCTION METHOD THEREFOR
摘要 <p><P>PROBLEM TO BE SOLVED: To form a metallic film pattern having excellent adhesion only on a required region even to a substrate having a smooth surface by a simple process. <P>SOLUTION: A photosensitive film containing a first catalyst is formed on a substrate (first stage). The photosensitive film is formed into a prescribed pattern (second stage). A metallic oxide film (such as a ZnO film) is selectively formed on the first catalyst subjected to the patterning by a wet film forming technique. A layer (second catalytic layer) being a catalyst of electroless plating is formed on the metallic oxide film (fourth stage). The substrate is dipped into an electroless plating bath, and a metallic film is deposited on the metallic oxide film (fifth stage). <P>COPYRIGHT: (C)2003,JPO</p>
申请公布号 JP2003213436(A) 申请公布日期 2003.07.30
申请号 JP20020009400 申请日期 2002.01.18
申请人 SHARP CORP 发明人 IZUMI YOSHIHIRO
分类号 G02F1/13;C23C18/12;C23C18/18;C23C18/32;C23C18/38;C23C18/42;C23C20/06;G02F1/1368;H01L21/288;(IPC1-7):C23C18/18;G02F1/136 主分类号 G02F1/13
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