发明名称 APPARATUS AND METHOD FOR FORMING FILM
摘要 PROBLEM TO BE SOLVED: To provide an apparatus and method for forming a thin film by using a raw material fluid obtained by mixing a film forming raw material with a fluid or a liquid in a supercritical state. SOLUTION: The raw material fluid in which a condensation polymer consisting of a composition element of metal oxide intended for formation, alcohol, and fluid or liquid carbon dioxide in the supercritical state are mixed is fed to the apparatus for forming the thin film. The apparatus includes a substrate holder 2 to hold a substrate 3 a film forming chamber 1 to accommodate the substrate holder, a feeding mechanism to feed the raw material fluid on a substrate surface and a lamp heater 4 to heat the substrate 3 held on the substrate holder 2. The thin film is formed by using the raw material fluid obtained by mixing the film forming raw material with the fluid or the liquid in the supercritical state. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003213425(A) 申请公布日期 2003.07.30
申请号 JP20020015140 申请日期 2002.01.24
申请人 UTEC:KK;SEIKO EPSON CORP 发明人 SUZUKI MITSUHIRO;KIJIMA TAKESHI;NATORI EIJI
分类号 C23C16/455;B01J3/00;B01J19/00;B01J19/12;B01J19/18;B05D1/02;C08F2/48;C23C18/12;H01L21/31;H01L21/316;(IPC1-7):C23C16/455 主分类号 C23C16/455
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