| 摘要 |
PROBLEM TO BE SOLVED: To obtain high film deposition capacity by efficiently vaporizing a raw liquid material in the CVD using the raw liquid material, and to easily maintain the film deposition capacity while reducing the necessity of the maintenance by suppressing clogging in the vicinity of a vaporizing unit. SOLUTION: A raw material nozzle 9 to spray the raw liquid material 1 downwardly and a vaporizing plate 8 which is a smooth heating surface inclined at the position sufficiently separated from the raw material nozzle 9 below the raw material nozzle 9 are provided in a heated vacuum vessel 4, and a vaporizing mechanism having a large sectional area of a part joined with a film deposition chamber is used. COPYRIGHT: (C)2003,JPO
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