| 摘要 |
PROBLEM TO BE SOLVED: To provide a CVD apparatus capable of depositing a uniform ceramic film over the entire surface of a base material by correctly and rapidly moving the supporting position of the base material without interrupting a CVD reaction, and a CVD film depositing method by the CVD apparatus. SOLUTION: This CVD apparatus comprises a rotary shaft 4 installed in a CVD reaction vessel, a base material supporting member 1 to support the base material 2 with at least three supporting blades 3 radially and circumferentially provided around the rotary shaft 4, and a movable supporter 5 disposed at the concentric position on the outer side of the base material supporting member 1, and the movable supporter 5 has an end part 6 of the size larger than the thickness of the base material supporting member on a tip thereof, and has an arm-shaped supporting tool 7 which is provided in an expandable, rotatable and vertically movable manner. COPYRIGHT: (C)2003,JPO
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