| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for manufacturing a fine glass particle deposit, in which the back flow of a corrosive gas from a reaction vessel and the rapid spouting of a glass source gas are suppressed when stopping and supplying the glass source gas at both ends of the accumulative layer of the fine glass particle. SOLUTION: The supply of the glass source gas to a burner at both ends of the accumulative layer of the fine glass particle is set to gradually become zero by using a gas flow rate controller. At the time or around the time of setting the supply of the glass source gas to be zero, an inert gas A (N<SB>2</SB>) is changed to the glass source gas (SiCl<SB>4</SB>) at the upstream of the gas flow rate controller 11, a gas flowing from the gas flow rate controller 11 is changed to a burner and an exhaust side at the downstream of the gas flow rate controller 11. An inert gas B (N<SB>2</SB>) is supplied or stopped to the burner at the downstream of the gas flow rate controller 11, and a glass source gas supply passage is purged with the inert gases A and B. COPYRIGHT: (C)2003,JPO |
