发明名称 Planarizers for spin etch planarization of electronic components
摘要 An electronic component contemplated comprises a) a substrate layer, b) a dielectric layer coupled to the substrate layer, c) a barrier layer coupled to the dielectric layer, d) a conductive layer coupled to the barrier layer, and e) a protective layer coupled to the conductive layer. The electronic component contemplated herein can be produced by a) providing a substrate; b) coupling a dielectric layer to the substrate; c) coupling a barrier layer to the dielectric layer; d) coupling a conductive layer to the barrier layer; and e) coupling a protective layer to the conductive layer. The protective layer may then be cured to a desirable hardness. A method of planarizing a conductive surface of an electronic component may comprise a) introducing or coupling a protective layer onto a conductive layer; b) dispersing the protective layer across the conductive layer; c) curing the protective layer; d) introducing an etching solution onto the conductive layer; and e) etching the conductive surface to substantial planarity.
申请公布号 US6600229(B2) 申请公布日期 2003.07.29
申请号 US20010847766 申请日期 2001.05.01
申请人 HONEYWELL INTERNATIONAL INC. 发明人 MUKHERJEE SHYAMA;LEVERT JOSEPH;DEBEAR DONALD
分类号 C23F1/02;C23F1/18;C23F3/06;H01L21/306;H01L21/321;H01L21/3213;H01L21/768;H01L23/532;(IPC1-7):H01L23/48 主分类号 C23F1/02
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