发明名称 Wafer drying apparatus
摘要 A wafer drying apparatus of increased efficiency in which isopropyl alcohol (IPA) supplied to a hood is activated by heat, thereby increasing its diffusion efficiency and enabling it to vaporize pure water on a wafer quickly, includes a washing tank for storing pure water, a hood positioned at an upper portion of the washing tank, an injection nozzle for ejecting IPA positioned in the hood, a storage tank for storing the IPA, a bubble maker in the storage tank to create IPA vapor, a nitrogen supplier for storing a carrier gas for transferring the IPA vapor in the storage tank to the hood, and a heater provided near the injection nozzle to heat the IPA vapor that is ejected through the injection nozzle to a predetermined temperature, thereby uniformly diffusing the IPA vapor.
申请公布号 US6598312(B2) 申请公布日期 2003.07.29
申请号 US20020101955 申请日期 2002.03.21
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM TAE-HO;HONG DONG-KWAN;KANG NUNG-SUCK
分类号 H01L21/304;H01L21/00;(IPC1-7):F26B21/06 主分类号 H01L21/304
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