发明名称 Method of fabricating jig for vacuum apparatus
摘要 A base member is blasted to roughen the surface. Next, a thermal spray member containing for example Al is formed on the blast treated surface of the base member by a thermal spraying. Next, an extremely thin oxide film at an atom layer level is coated on the surface of the thermal spray member, as an uppermost surface. The oxide film is a layer that is formed from stacked layers of about 15 to 23 atoms, and is formed by an O2 or O3 gas plasma, an atmospheric pressure plasma, or a CVD (chemical vapor deposition) method. A nitride film can be coated instead of the oxide film.
申请公布号 US6599581(B2) 申请公布日期 2003.07.29
申请号 US20020050913 申请日期 2002.01.22
申请人 SEIKO EPSON CORPORATION 发明人 SHIBASAKI MASAO
分类号 C23C14/00;C23C14/50;C23C14/56;C23C16/458;H01L21/203;H01L21/205;H01L21/31;(IPC1-7):C23C4/04 主分类号 C23C14/00
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