| 发明名称 |
Method for controlling flatness of wafer and manufacturing method of thin-film magnetic head |
| 摘要 |
A gas at an extremely low temperature is jet-sprayed onto a warped concave surface of a wafer to correct this warped concave surface flat.
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| 申请公布号 |
US6599435(B2) |
申请公布日期 |
2003.07.29 |
| 申请号 |
US20010867425 |
申请日期 |
2001.05.31 |
| 申请人 |
TDK CORPORATION |
发明人 |
KUBOTA TOSHIO;KIMURA FUJIMI |
| 分类号 |
G11B5/31;H01L21/304;H01L21/3213;(IPC1-7):B44C1/22 |
主分类号 |
G11B5/31 |
| 代理机构 |
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代理人 |
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| 地址 |
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