发明名称 Deep trench-buried layer array and integrated device structures for noise isolation and latch up immunity
摘要 The preferred embodiment of the present invention provides a buried layer that improves the latch up immunity of digital devices while providing isolation structures that provide noise isolation for both the digital and analog devices. The buried layer of the preferred embodiment is formed to reside within or below the subcollector region in the transistor. Additionally, in the preferred embodiment the subcollector is isolated from buried layer outside the transistor region by deep isolation trenches formed at the edges of the subcollector. Additionally, an array of deep isolation trenches provides increased isolation between devices where needed. Thus, the preferred embodiment of the present invention provides an integrated circuit structure and method that provides improved latchup immunity while also providing improved noise tolerance.
申请公布号 US6600199(B2) 申请公布日期 2003.07.29
申请号 US20000752061 申请日期 2000.12.29
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 VOLDMAN STEVEN H.;JOHNSON ROBB A.;LANZEROTTI LOUIS D.;ST. ONGE STEPHEN A.
分类号 H01L21/331;H01L21/761;H01L21/8249;(IPC1-7):H01L29/76;H01L29/94;H01L31/062 主分类号 H01L21/331
代理机构 代理人
主权项
地址