发明名称 Semiconductor device
摘要 A semiconductor device capable of preventing variations in threshold voltage and having high reliability is provided. The semiconductor device includes a semiconductor substrate having a semiconductor region, and a field-effect transistor. The field-effect transistor includes a gate electrode, source and drain regions, and a channel region. The channel region includes a pair of lightly doped impurity regions having a relatively low impurity concentration as well as a heavily doped impurity region located between the lightly doped impurity regions and having a relatively high impurity concentration.
申请公布号 US6600195(B1) 申请公布日期 2003.07.29
申请号 US20000637870 申请日期 2000.08.15
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 NISHIDA YUKIO;SAYAMA HIROKAZU;ODA HIDEKAZU;OISHI TOSHIYUKI
分类号 H01L21/265;H01L21/336;H01L21/8234;H01L29/78;(IPC1-7):H01L29/76;H01L29/94;H01L31/052;H01L31/113;H01L31/119 主分类号 H01L21/265
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