发明名称 Semiconductor device with protective element
摘要 A semiconductor device having a metal oxide semiconductor (MOS) transistor with a gate dielectric film, a gate electrode formed on the gate dielectric film, and source/drain regions formed in a semiconductor substrate. A protective element with a protected electrode overlays of the semiconductor substrate with an intervention of a dielectric film. At least one diffused region is adjacent to the protective electrode in the semiconductor substrate. The protect dielectric is connected to the electrode of the MOS transistor.
申请公布号 US6600176(B2) 申请公布日期 2003.07.29
申请号 US19990351134 申请日期 1999.07.12
申请人 NEC ELECTRONICS CORPORATION 发明人 NOGUCHI KO
分类号 H01L29/78;H01L21/8234;H01L27/02;H01L27/088;(IPC1-7):H01L29/72 主分类号 H01L29/78
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